In the field of precision manufacturing, even tiny differences on the surface often determine product performance and reliability. How to efficiently, non-destructively and environmentally achieve material surface cleaning, activation and modification has become a common challenge for many high-end manufacturing industries. Guangdong Anda Automation Solutions Co., Ltd. (Stock Code: 688125), as the first A-share listed enterprise specializing in the R&D and production of fluid control equipment, provides systematic intelligent solutions for this problem with its leading plasma cleaning technology.

Plasma, regarded as the fourth state of matter, is a collection of ions, electrons and neutral particles generated by gas ionization under specific conditions. Leveraging this characteristic, Anda Automation has developed efficient plasma cleaning technology. Compared with traditional chemical cleaning methods, plasma cleaning has significant advantages such as no pollution, no damage, uniform treatment and wide applicability to materials. By bombarding the material surface with high-energy particles, it can effectively remove micro-pollutants, organic substances and oxides, while activating surface chemical bonds, greatly improving the adhesion and reliability of subsequent processes (such as bonding, welding and coating).

    Anda Automation's plasma product line is rich, covering two major technical paths of atmospheric pressure and vacuum, meeting different needs from online continuous production to offline precision processing.

• Features: Can be directly integrated into automated production lines to realize continuous operation with high efficiency

• Representative model: VP-10L

• Aluminum alloy vacuum chamber with ultra-low temperature treatment (down to 40℃)

• Motorized conveyor width adjustment with strong compatibility, suitable for online surface treatment in automotive electronics, precision components and other industries.

• Features: Designed for high-efficiency and mass production with extremely high automation, especially suitable for semiconductor packaging and other fields.

• Representative model: VP-10S (With Loading Area)

• Four-channel design, capable of processing 4 products simultaneously with UPH up to 400-550pcs.

• Complies with SEMI safety standards, adopts wafer-level MFC patented design with excellent airtightness (up to within 5Pa), supports process gases such as hydrogen, safe and reliable.

• Significantly reduces contact angle (<10°) and greatly improves surface activity.

• Features: Suitable for small-batch, multi-variety and high-precision scientific research or production scenarios with strong flexibility.

• Representative model: VP-80L

• Optional chamber volume, made of stainless steel, equipped with high-precision RF power supply and mass flow controller.

• Widely used in scientific research, medical treatment, precision metal processing and other fields.

• High Speed, High Precision, High Quality: Comprehensive optimization from structure, parts to software.

• Miniaturization, Modularization, Platformization: Achieving compact equipment, configurable functions and rapid development.

• Generalization, Flexibility, Intelligence: Meeting multi-product co-line production, rapid product changeover, and having the ability of automatic data interaction and processing.