Introduction: The single-chamber Asher independently developed by Andong, adopts an automatic three-axis high-precision robotic arm, microwave plasma generator, and single-wafer reaction chamber design, based on the Windows platform with a user-friendly interface, and the system architecture is reasonable. The equipment has the advantages of a small footprint, high productivity, low cost of consumables, and low operating costs. It is suitable for the removal of various photoresists in the front and rear sections of semiconductors.

Advantages:

•Suitable for 4'' 6'' and 8'' wafers (silicon-based and compound semiconductors)

•Adaptive robotic arm, pick and place accuracy 0.05mm

•Highly sealed cavity design, vacuum bottom pressure 30mT

•Microwave + quartz gas path design, degumming uniformity 5~7%

•Increasing FFU effectively reduces particle pollution